OTF-1200X-4-RTP-UL is a  compact rapid thermal processing tube furnace with a 4" I.D. processing quartz tube and vacuum flanges. It is designed for annealing semiconductor wafers or solar cells with diameters up to 3". OTF-1200X-4-RTP is heated by 8 units of 1KW halogen light with a max. heating rate of 50ºC/second. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps. RS485 port and control software are included to make monitoring the temperature profile via PC while simultaneously running furnace possible.